Webcast: Metrology Gears for the Nanotech Age
Webcasts
A New Dimension in Advanced Process Development: 3D Atom-Scale Analysis
Taking Sub-45nm Process Characterization to the Next Level
Intel's Journey With SAP Customer Relationship Management (SAP CRM)
XHR: SEM Like You've Never Seen Before
Rewiring Chips with FIB Circuit Edit: Speed-Up Design Validation & Performance Optimization
Originally broadcast October 21, 2008
Inspection, measurement, and test instrumentation are integral to nanotech applications, and vital to advances in the design of nanomaterials and ultimately for the manufacturing of nanotechnology-based products. However, the resolution, accuracy and capability of many metrology technologies are reaching their limits, and may not meet all the needs of nanotech manufacturing processes. Revolutionary, rather than evolutionary, advances become necessary. Possible metrology technology options will be discussed by experts in the field.
Moderator:
| Alexander Braun Senior Editor Semiconductor International |
Panelists:
| Alain Diebold College of Nanoscale Science and Engineering (CNSE) of the University at Albany (New York) |
| Christopher Ober Cornell University |
| Wilfried Vandervorst IMEC |
Webcast Registration Policy
The participation of our sponsors in this webcast enables us to provide this event free of charge to our registrants. Part of the value we are able to provide our sponsors is information they can use to more effectively market their products and services. Accordingly, by registering for this webcast you are agreeing that we may share your registration information with our sponsors. We do not permit these companies to use your personally identifiable information without your permission for any purpose other than to send you information about their own products and services.
Posted: Sep 5, 2008