Webcast: XHR: SEM Like You've Never Seen Before

July 10, 2008 @ 12 p.m. Central

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Sign up now for this webcast and find out what it means to see SEM like you've never seen before. With shrinking semiconductor geometries, advanced process development and engineering groups have struggled to get the images and data they need from SEM platforms. But recent advancements in SEM technology have brought new levels of performance and flexibility not previously available to the lab. A revolutionary new class of Extreme High Resolution (XHR) SEM now allows semiconductor labs to provide process developers and engineers with a high volume of sub-nanometer resolution images with high materials contrast, while maximizing surface sensitivity. In addition, the XHR SEM provides advanced IC logic manufacturers the ability to view complex 3-D surfaces and interfaces from multiple angles to optimize process development at the 32 nm node and below. With better imaging performance, quality and throughput, advanced semiconductor labs can substantially reduce unnecessary delays and speed up time to market. In this webcast you will learn more about how XHR SEM enables greater innovation and productivity at the nanoscale.

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Speakers:

Richard Young Technologist SEM/SDB FEI Company

Richard Young is a technologist in the semiconductor lab market group at FEI, focusing on dualbeam and SEM systems used for failure analysis and characterization. He has been with FEI since 1991. Young holds a Ph.D. in physics from the University of Cambridge, where he conducted research on the application of focused ion beams for TEM sample preparation and gas chemistry. He hold several U.S. patents and has published widely on FIB and DualBeam applications.

Todd Templeton  Product Marketing Manager SEM/SDB FEI Company

Todd Templeton joined FEI in early 2007 as a product marketing manager in the nanoelectronics division of FEI, focused on SEM and small dualbeam systems for failure analysis and TEM prep. Templeton has worked in the semiconductor industry since 1995, first as a process engineer at SEH and then later as both an application engineer and product manager for wafer metrology and inspection supplier ADE.

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