Webcast: Advanced Process Control Enables Next-Generation Devices
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Originally broadcast July 12, 2007
Our industry crossed the sub-100 nm border into nanotechnology quite some time ago. In this demanding environment of smaller and more delicate architectures, as well as shorter and increasingly unforgiving process windows where sometimes even irreducible differences in the components of identical tool chambers can influence yield results, advanced process control (APC) becomes an urgent necessity. This webcast’s panel of distinguished experts discuss some of the latest advances in APC and examine what will be required to continue to support Moore’s Law in the future.
Moderator:
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Alexander E. Braun Senior Editor Semiconductor International |
Panelists:
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Nital Patel Senior Staff Process Control Systems Architect Intel Corp. |
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James Dougan Principal Staff Engineer Freescale Semiconductor |
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Kevin Brady Principal Investigator, Technical Research Project Infrastructure for Integrated Electronics Design and Manufacture National Institute of Standards and Technology (NIST) |
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Posted: Jun 8, 2007