R&D labs depend on innovative imaging and analysis techniques to develop the manufacturing processes for future-generation semiconductor devices. Powerful microscopes like the FEI® Titan™ S/TEM offer stunning 2D images and analysis.  more >>

Shrinking device geometries have made transmission electron microscopes (TEM) a necessity for developing and monitoring advanced semiconductor manufacturing processes. The ability to perform TEM imaging and analysis at the sub-nanometer scale is crucial to stay ahead of the curve.  more >>

Learn first-hand how Intel leveraged SAP CRM for greater agility to support business growth, while achieving 15%+ year-over-year cost savings.  more >>

Sign up now for this webcast and find out what it means to see SEM like you've never seen before. Advanced process development and process engineering groups have recently struggled to get the images and data they need from SEM platforms. But recent advancements in SEM technology have brought new levels of performance and flexibility not previously available to the lab.  more >>

Today leading semiconductor companies employ focused ion beam (FIB) circuit editing to speed up design validation and performance optimization. FIBs can remove and deposit insulator and conductor materials to "re-wire" around flaws or to make circuit performance improvements. The material removal and deposition is done with high precision using an ion beam together with a variety of chemical gases. FIB circuit editing eliminates iterative cycles of prototype testing and mask modification.  more >>

Experts from FEI Company and the National Renewable Energy Laboratory (NREL) will discuss new analysis and characterization capabilities for novel materials and devices. Dr. Manuel Romero of NREL will present recent advances in scanning electron microscopy (SEM) that can be applied to state-of-the-art materials in the solar field, and Dr. Richard Young of FEI will discuss how you can maximize the analytical performance and flexibility of your SEM.  more >>

When you're working at advanced geometries, you'll need tools and techniques that give you better resolution to find and analyze previously hidden failures. This seminar will show you how to combine in-situ probing techniques with scanning electron microscopy (SEM) or DualBeam tools to gain superior results at 90nm and below.  more >>