Webcast: Litho Forum Survey: EUV by 2016?

June 3, 2008 10:47pm CDT

Originally broadcast June 3, 2008

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Particularly with the push from flash memory manufacturers, the lithography industry is under pressure to develop the technologies needed to continue with transistor scaling - whether that's EUV lithography, double patterning, nanoimprint, high-index immersion, maskless, or all of the above. But what techniques will really be favored? Find out what the leading chipmakers and industry experts have to say about insertion schedules and readiness assessments of future lithography technologies in this presentation of the full results from surveys conducted before and after this year's Sematech Litho Forum.

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Moderator:

Aaron Hand Executive Editor, Electronic Media Semiconductor International

Speaker:

Bernie Roman Litho Forum Program Chair Sematech

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Posted May 7, 2008