Semiconductor International - February 01, 2007
Cover Story
Double Patterning Wrings More From Immersion Lithography
Whether you are in the camp that believes
extreme ultraviolet (EUV) is the only logical answer for next-generation
lithography, or you think there must be another workable alternative out there,
most are in agreement that optical lithography will need continued extensions
for several years to come.
Features
Technology News
| Departments
Special Report
|
