Semiconductor International - August 01, 2006
Cover Story
Nanoimprint Lithography: A Contender for 32 nm?
Imagine patterning a low-k dielectric with dual-damascene structures — both vias and trenches — in a single step, thereby reducing 123 process steps. That's what nanoimprint lithography can do. Plus it's cost-effective in its own right, with unlimited resolution.
Features
Technology News
| Departments
Special Report
|
