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Semiconductor International - May 01, 2006
Cover Story
Containing the Finite Size Effect in Copper Lines
Optimized plating chemistry, overburden and anneal conditions result in a copper line where resistivity is limited only by scattering from the line surfaces.
Features
Monitoring Cu Electroplating and Co Electroless Deposition
Advanced Interconnect Metrology Girds for Changes
Technology News
Emerging Technologies
Graphene-Based Devices Use Electron Diffraction
Inspection, Measurement and Test
Future CD-SEM Calibration Standard Develops
Lithography
Mask Players Debate Survival in Immersion Environment
Semiconductor Packaging
Via Lands Double as Bonding Pads
Insulated Bonding Wire Taking Hold
Wafer Processing
Sematech to Research Germanium
Yield Management
Solutions to Five Yield, Reliability Problems
Departments
Analyst Spot
x86 Microprocessors Challenge Semiconductor Manufacturing
Editorial
Not Just Design: India Set to Manufacture
Expert Perspectives
MEMS: The Next Generation
Industry Watch
Copper Plugs Look Promising
Movers and Shakers
Jeffery Butterbaugh, Chief Technologist, FSI International
SEM/TEM of the Month
SEM/TEM of the Month
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