Semiconductor International - February 01, 2006
Cover Story
Hyper-NA Immersion Faces Polarization Challenges
To get immersion lithography to the 32 nm node
and beyond will require innovations in high-index fluids, lenses and resists.
The hyper-NA lenses required for increased resolution will bring with them
further polarization issues that the lithography community is just beginning to
get a handle on.
Features
Technology News
| Departments
|
