Semiconductor International - September 01, 2004
Cover Story
One on One: A Closer Look at Nanoimprinting
Nanoimprint lithography, with its use of 1:1 templates, has the potential to return lithographers to a simpler time, yet still achieve feature sizes of <10 nm. Though moving from academia to industry, it is still very much in its infancy, and has yet to be proven in a production environment.
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