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Semiconductor International - June 01, 2000

Cover Story

Dual-Damascene: Overcoming Process Issues
Dual-damascene is an elegant technique of inlaying metal for interconnects, wiring throughout the back-end-of-line. Damascene processes were developed when efforts to develop an effective copper etch process failed. Once faced with hurdles such as different structures and complete changes in equipment, copper dual-damascene is proving to be process-friendly and cost-effective.



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