Semiconductor International - June 01, 2000
Cover Story
Dual-Damascene: Overcoming Process Issues
Dual-damascene is an elegant technique of inlaying metal for
interconnects, wiring throughout the back-end-of-line. Damascene processes were
developed when efforts to develop an effective copper etch process failed. Once
faced with hurdles such as different structures and complete changes in
equipment, copper dual-damascene is proving to be process-friendly and
cost-effective.
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