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Podcasts : SI On the Scene : ITRS Lithography Update Weeds Out 45 nm Options

Mike Lercel, lithography director at Sematech and also U.S. chair of the ITRS lithography working group, highlights the latest updates to the ITRS Lithography chapter, including changes in potential solutions and tighter CDU and overlay requirements.

ITRS Lithography Update Weeds Out 45 nm Options

Mike Lercel, lithography director at Sematech and also U.S. chair of the ITRS lithography working group, highlights the latest updates to the ITRS Lithography chapter, including changes in potential solutions and tighter CDU and overlay requirements.

Posted: Dec 21, 2007 | Listen Now | Download MP3 | | Subscribe Now and never miss an episode
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