Podcasts : SI On the Scene : IMEC Expecting Two EUV Source Upgrades

IMEC Expecting Two EUV Source Upgrades

As a follow-up from the EUVL Symposium in Sapporo, Japan, Kurt Ronse, IMEC’s director of lithography, talks about the source upgrades expected on the EUV alpha demo tool at IMEC, plus a variety of other issues surrounding EUV lithography’s development.