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     Craig Hunter is vice president and general manager of the solar business at Intermolecular (San Jose), which specializes in combinatorial R&D. He previously worked at Applied Materials, where he led the company's entry into the thin-film solar business. In this interview, Hunter discusses the economic and technical future of PV.

Photovoltaics on Track for Long-Term Role

Craig Hunter is vice president and general manager of the solar business at Intermolecular (San Jose), which specializes in combinatorial R&D. He previously worked at Applied Materials, where he led the company's entry into the thin-film solar business. In this interview, Hunter discusses the economic and technical future of PV.


Movers & Shakers

Each month, Senior Editor Alexander E. Braun presents key people that are shaping our industry.
Larry Sumney, president, CEO and chairman of the board of Semiconductor Research Corp., gives his views on the state of semiconductor research in the United States and worldwide, and about the necessity to establish technology roadmaps for beyond-CMOS and photovoltaic technologies.

SRC Chief Urges Beyond-CMOS, PV Technology Roadmaps

Larry Sumney, president, CEO and chairman of the board of Semiconductor Research Corp., gives his views on the state of semiconductor research in the United States and worldwide, and about the necessity to establish technology roadmaps for beyond-CMOS and photovoltaic technologies.


SI On the Scene

On location around the world, Semiconductor International editors are talking to the people who are shaping the industry. We've got our digital recorders in hand as we catch up with the key players attending conferences and tradeshows, as well as one-on-one visits. Check back often to listen in on the latest conversations regarding technology and industry developments.
At the 2010 SPIE Advanced Lithography conference, Senior Editor Alexander E. Braun interviews Ron Kool, vice president and manager of ASML's EUV Business Unit, about the state of the much-delayed EUV litho development, and ongoing efforts to extend 193 nm immersion to 16 nm and well beyond.

EUV Litho Still on the Defensive

At the 2010 SPIE Advanced Lithography conference, Senior Editor Alexander E. Braun interviews Ron Kool, vice president and manager of ASML's EUV Business Unit, about the state of the much-delayed EUV litho development, and ongoing efforts to extend 193 nm immersion to 16 nm and well beyond.


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