Top Stories

Group Opposing 450 mm N.Y. Subsidy

A "Concerned Citizen Group" is opposing any New York State funding for a 450 mm wafer development center at CNSE/Sematech in Albany, N.Y. The group told New York politicians that any state funding for 450 mm development would not benefit companies operating in the state, and would be a "reckless waste of taxpayer money." More

Current Issue

FEATURES

CMOS Transitions to 22 and 15 nm

2010 Executive Outlook: Cautious Optimism Emerges

2010 Economic Forecast: How High the Jump?

View Current Issue

FREE Subscription

News from the Web

Nanotechnology Boosting Performance of Water-Splitting Solar Cells for Hydrogen Production
Source: www.azonano.com
Date: 4 hours 42 minutes 41 seconds ago.
Micron and Nanya to Start Making DDR3 Using 42nm Process Technology
Source: www.xbitlabs.com
Date: 10 hours 35 minutes 50 seconds ago.
ON Semiconductor, Vishay: Semi Winners (at TheStreet.com)
Source: www.thestreet.com
Date: 11 hours 26 seconds ago.
Officials underscore Brazil's chip-making ambitions
Source: www.eetimes.com
Date: 11 hours 49 minutes 37 seconds ago.
View All Stories

Most Viewed Stories for Week of Feb. 1, 2010
The arrests in South Korea related to alleged theft of Samsung Electronics' know-how by Applied Materials Korea staff leads our Top 5 list this week. Yet to be determined if this was an inadvertent leak or a true conspiracy to profit from Samsung's techniques. Two blogs, one from Dick James on Apple's iPad and another by Phil Garrou on Samsung's 3-D roadmap, made the list. Stories on Cornell's crystal growth research, and a foundry ranking by IC Insights, also garnered reader attention.
Fan-Out Packaging Dispute Resolves in IP Licensing Deal
What began as a patent dispute over fan-out packaging technologies has resulted in an IP agreement that will ultimately make it easier for packaging subcontractors to license Epic's ChipsFirst and Freescale's RCP technologies in one step, said James Kohl, Epic's CEO.
Applied Korea at Center of IP Theft Case
South Korean prosecutors said Applied Materials Korea staff "extensively" gathered secret Samsung memory chip production technology and passed the intellectual property to Hynix Semiconductor. Seoul prosecutors arrested two, and booked 10 other Applied staffers without putting them in jail, according to reports in Korea. A Hynix executive and a Samsung employee also were arrested.
Crystal Growth Points to Defect-Free Thin Films
Cornell University researchers said colloidal research may lead to the discovery of principles that will enable the growth of defect-free thin films. The team led by Professor Itai Cohen tested conditions that lead to smooth crystal growth, and discovered that the random darting motion of the particles is a key factor affecting how crystals grow.
View All Stories

Free Business Purchase Quotes

Compare prices and features for auto dialer software.
Semiconductor International has partnered with BuyerZone to bring you free price quotes on hundreds of products, including auto dialer software and document management solutions.

Inspection, Measurement & Test

View All Stories

Featured Company

Technical Manufacturing Corporation

TMC designs and manufactures precision vibration isolation systems for sensitive research and manufacturing processes worldwide. The ISO 9001:2008-certified company's products are industry standards in semiconductor manufacturing, life sciences and... more

Most Recent Resources

STACIS® SEM-Base™ Active Vibration Cancellation Floor Platform for...

News From Lexis Nexis

Malaysia Approves 100,000 New Foreign Workers Since October

In-Stat: iPad Energizes $4B Tablet PC Semiconductor Opportunity by 2014

Micron, Nanya Unveil 42 nm DRAM Process, 2 Gbit DDR3 DRAM

Nissha Licenses Peratech's Technology for Touch Screens

Blogs
Talkback
Podcast
Video

Perspectives From the Leading Edge

Philip Garrou, Consultant
February 6, 2010
On Copper Diffusion, Gettering and the Denuted Zone
The impact of 3D processing on transistor electrical performance was the theme of...
More

Images to Devices: The Patterning Business

Mike Watts, Impattern Solutions
February 3, 2010
LED’s at Photonics West – 94% of the light gets out !
Academics and industrialists from all over the world provided a series of first...
More

Dick James, Senior Technology Analyst
February 2, 2010
STMicroelectronics Becomes the Dominant Player in Consumer MEMS - Now They're Going for Gyros
One of the chip sectors that we watch on an ongoing basis, and in which we...
More

EUVL Focus

Vivek Bakshi, EUV Litho Inc.
December 28, 2009
USHIO Gains Market Share in EUV Source Business
I missed the announcement of USHIO’s acquisition of Philips Extreme, so I...
More

View All Blogs

Yeah stop those evil 450mm Fabs. Then you can be like Pennsylvania where the last...

D. Cowdrick– 2/8/2010 10:53:54 PM CST
in response to Group Opposing 450 mm N.Y. Subsidy
If costs have doubled or more, margins will still be dropping. Even on the demand...

gd– 2/8/2010 8:01:22 PM CST
in response to 2010 Economic Forecast: How High the Jump?
I believe that the group(s) opposed to the proposed 450 mm wafer processing plant...

kkazem– 2/8/2010 3:23:06 PM CST
in response to Group Opposing 450 mm N.Y. Subsidy
Now here is an idea, how about giving these companies that are interested in...

Daryl– 2/8/2010 12:43:48 PM CST
in response to Group Opposing 450 mm N.Y. Subsidy

VIEW ALL TALKBACK THREADS

Sematech’s New President Looks for Increased Collaboration

Daniel Armbrust has been appointed president and CEO of Sematech, succeeding Michael Polcari, who is now that industry organization's chairman of the board. In this month's podcast interview, Armbrust, who was most recently responsible for the operation of IBM's 300 mm fab in East Fishkill, N.Y., discusses his plans for Sematech, R&D funding, and the need for closer cooperation among semiconductor industry organizations.

The Coming of EUV Lithography – When?

Senior Editor Alexander E. Braun interviews Toppan Photomasks CTO Franklin Kalk at the SPIE Photomask conference about the status of lithography in general and EUV lithography development in particular. Kalk believes considerable work and development still remain to be done for EUV to become a mainstream reality.