SPIE Advanced Lithography

When: 02/22/2009 - 02/27/2009

Location: San Jose (Calif.) Convention Center

SPIE Advanced Lithography is the premier annual international forum bringing practitioners of micro- and nanolithography together in a stimulating, informative and interactive environment.

Present your work in any of these technical areas:

Alternative lithographic technologiesMetrology, inspection and process control for microlithographyAdvances in resist materials and processing technologyOptical microlithographyDesign for manufacturability through design-process integration

Submit an abstract by August 11, 2008

Additional information:
Website: http://www.spie.org/advanced-lithography.xml