Sematech Advanced Mask Cleaning Workshop

When: 09/14/2009

Location: Monterey, Calif.

Held in conjunction with SPIE Advanced Lithography, this full-day workshop provides a forum for Sematech members, mask and wafer cleaning suppliers, and researchers to discuss advancements in technologies and solutions applicable to advanced mask cleaning and surface preparation challenges. Topics include sub-30 nm particle removal, molecular contamination removal, mask inspection defect analysis, and environmental approaches to mask cleaning.

Additional information:
Website: http://www.sematech.org/cgi-bin/public_meetings.cgi?sema