2009 International Workshop on EUV Lithography

When: 07/13/2009 - 07/17/2009

Location: Sheraton Waikiki, Oahu, Hawaii

EUV Litho Inc. is inviting presentations and poster papers for EUV lithography-related topics, including sources, exposure tools, masks, optics, resists, contamination, metrology, patterning and cost of ownership. Technology review papers and papers with innovative approaches to address current EUVL-related technical challenges are encouraged.

The workshop will consist of invited papers/sessions and panel discussions, in addition to regular presentation papers and a poster session. The workshop's focus is on R&D topics, and it will provide a forum for discussion of current EUVL technical challenges.

A lithography education program July 13-14 will provide participants with technical background and education in the area of EUVL. The workshop will start with registration and a reception July 14 and will be followed by presentations, panel discussions and poster session July 15 and 16. The workshop will conclude with a steering committee meeting July 17, which is also open to workshop attendees.

Additional information:
Website: http://euvlitho.com