Date: Sept. 28-Oct. 1, 2008

Location: Lake Tahoe, Calif.

The 2008 EUVL Symposium is a key industry forum for industry experts and researchers to discuss and assess the continued progress and maturity of extreme ultraviolet (EUV) lithography technology and the infrastructure needed to support its insertion into production.

EUVL is now well into the alpha tool demonstration phase, in which critical elements of the technology and infrastructure are being evaluated at the system level. Yet at the same time, the industry still faces a significant number of challenges to prepare for the arrival of EUV beta and pilot production tools in the next few years. These challenges include progress in key critical technology issues such as:

• Demonstration of reliable high-power source and collector modules.
• Simultaneously meeting resist resolution, sensitivity and line-edge roughness specifications.
• Fabricating defect-free masks.

The symposium provides a forum for the worldwide EUVL technology community to gather, present and discuss new developments, issues and solutions for the advancement of EUV lithography into cost-effective, manufacturable solutions.

www.sematech.org/meetings/announcements/8285