Date: Feb. 22-27, 2009

Location: San Jose (Calif.) Convention Center

SPIE Advanced Lithography is the premier annual international forum bringing practitioners of micro- and nanolithography together in a stimulating, informative and interactive environment.

Present your work in any of these technical areas:

• Alternative lithographic technologies
• Metrology, inspection and process control for microlithography
• Advances in resist materials and processing technology
• Optical microlithography
• Design for manufacturability through design-process integration

Submit an abstract by August 11, 2008

www.spie.org/advanced-lithography.xml