Date: Oct. 6-10, 2008

Location: Monterey, Calif.

The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to present your research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.

www.spie.org/photomask.xml