Date: June 10-12, 2008

Location: Maui, Hawaii

The workshop will consist of invited papers/sessions and panel discussions, in addition to regular presentation papers and a poster session. It will focus on R&D topics and provide a forum for discussion and education. Participants can expect to understand critical EUV lithography challenges and brainstorm innovative solutions.

Please submit abstracts of less than 200 words. Indicate whether an oral or poster paper is preferred. Abstracts should be submitted via email to euvlworkshop@euvlitho.com by March 17, 2008.

www.euvlitho.com