Date: Oct. 28-31, 2007

Location: Sapporo (Japan) Convention Center

Extreme ultraviolet lithography (EUVL) has entered the alpha tool demonstration phase, in which critical elements of the technology and infrastructure are, for the first time, evaluated on a system level. At the same time, the industry still faces significant challenges ahead to prepare for EUV beta tool and pilot line support over the next two years.

The 2007 International EUVL Symposium, organized by EUVA and Selete in cooperation with Sematech and the EUV Cluster Steering Committee, is the key industry forum where industry experts discuss and assess the maturity of the EUVL infrastructure and technology to support adoption of EUVL in pilot lines later this decade. This includes progress in key critical issues such as:

• Demonstration of reliable high power source and collector modules.
• Simultaneously meeting resist resolution, sensitivity and line edge roughness specifications.
• Availability of defect-free masks.

Specifically, industry experts will be critically evaluating the readiness of EUV sources to assess their potential for supporting EUVL beta tools in the near future.

The symposium will provide a forum for the worldwide EUVL technology community to gather, present and discuss new developments, issues and solutions for the continued advancement and improvement of EUV lithography.

www.sematech.org/meetings/announcements/8059/