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Semiconductor International NewsBreak
TOP STORY... November 19, 2008

3-D, TSV Need Standards and Thermal Solutions to Advance
Tuesday sessions at the 3-D Architectures for Semiconductor Integration and Packaging conference this week in Burlingame, Calif., indicate that although the technology is progressing and coming into use, there still are unanswered questions about practical, real-world, high-level applications. Among these is a lack of standards to enable all sectors of the industry -- OEMs, material providers, designers and fabs -- to work together harmoniously and efficiently.
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The resolution, accuracy and capability of many metrology technologies are reaching their limits, and may not meet all the needs of nanotech manufacturing processes. In this on demand webcast, possible metrology technology options are discussed by experts in the field.
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FEATURED BLOG...

Perspectives From the Leading Edge: 3-D IC at the WLP Conference
3-D integration has now penetrated the Wafer Level Packaging Conference, which SMTA holds each fall in San Jose, notes Phil Garrou in his latest blog posting. To be fair, though, he adds, all the key players in CMOS image sensors have already adopted backside through-silicon vias (TSVs), and the current CIS packages are WLPs, so there is certainly overlap.

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