SEMICON West 2008 Executive Outlook
To get in the mood for SEMICON West 2008, which starts in three weeks in San Francisco, consider these C-level thoughts contributed to SI's Mid-June show planner issue. Managers are emphasizing the importance of energy conservation, cost-effectiveness and high productivity — key measures going forward. In the front end, all eyes are on the extension of 193 nm lithography with immersion and double patterning, along with making high-k/metal gate processes more cost-effective. Meanwhile, real 3-D integration is occurring with package-on-package (PoP) and 3-D ICs using through-silicon vias (TSVs).