The Fine Print: EUV Lithography Workshop: A Guest Perspective
A guest post from Kenneth Goldberg, a physicist at Lawrence Berkeley National Laboratory (LBNL), provides a perspective on the International Workshop on EUV Lithography, held last week in Maui. Goldberg, who works on EUV optics testing and mask inspection, describes the current lack of resources devoted to EUV mask inspection. The Maui conference succeeded, Goldberg writes, because "projects and topics that often don't get much attention were featured here, particularly on sources." Goldberg responded to a request from Aaron Hand, executive editor, electronic media, to provide feedback on the workshop.