Semiconductor International NewsBreak
Semiconductor International NewsBreak
TOP STORY... June 17, 2008

IMEC Devises Simplified
High-k/Metal Gate for 32 nm

At today's VLSI Symposium on Technology in Hawaii, IMEC reported improved performance for a planar CMOS device using hafnium-based high-k dielectrics and tantalum-based metal gates. The simplified process has six fewer process steps and features reduced inverter delay of 10 psec relative to 15 psec for a FUSI device.
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MORE NEWS...

Intel Spins Off Assets to Create Solar Cell Company

Cadence Proposes Acquisition of Mentor Graphics

Flat Q2 Growth Expected, Not Disappointing

Unisem Licenses FlipChip International's Bumping Tech

Aviza Develops Etch/PVD/CVD Tool for 3-D IC R&D

MORE >>

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Hamamatsu Enhances Thermal Imaging Sensitivity
Hamamatsu’s Themos-1000 True Thermal emission microscope delivers 100 times greater thermal sensitivity and improved resolution for the localization of heat related semiconductor defects including shorts and leakage and is an ideal complement to OBIRCH and other laser techniques for dynamically powered devices. Click here.
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Innovation at Risk — Intellectual Property Challenges and Opportunities
Semiconductor equipment and materials suppliers face serious and mounting challenges in intellectual property (IP) protection, with adverse economic consequences for the entire microelectronics industry, according to a new white paper published by SEMI. In this webcast, Vicki Hadfield summarizes the key findings of the white paper, then panelists Jerry Coder, Hamid Zarringhalam and Harvey Frye explore some of the details of IP infringement, the forms it takes, the action companies can and have taken, and the types of reform that are needed.

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Ludl Electronic Products
Only Ludl Electronic Products offers complete high performance solutions for difficult wafer inspection. Modular components for precision positioning, edge handling, wafer flipping are available for turn-key or OEM applications. Visit our website or contact us for an expert consultation.
Click here!

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