The Fine Print: Maskless E-Beam: Worth Another Look?
Aaron Hand, SI's executive editor, electronic media, blogs on what TSMC's Burn Lin — a self-described optical bigot most of his life — now has to say about maskless lithography. Lin "makes some awfully good arguments" on the ability of maskless cluster tools "to give a chipmaker just the amount of throughput it needs or can afford; a smaller footprint than EUV; and the clincher: cost." Also, several readers offered some insightful comments about their perceptions of maskless lithography.