Semiconductor International NewsBreak
Semiconductor International NewsBreak
TOP STORY... June 4, 2008

IITC Papers Range From
Plasma Modeling to Copper Encapsulation Techniques

Papers presented at this week's International Interconnect Technology Conference (IITC) include work on modeling, plasma-enhanced atomic layer deposition, and thin self-aligned barrier layers that inhibit electromigration at the 32 nm node and beyond when combined with encapsulated copper wiring.
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