Semiconductor International NewsBreak
TOP STORY... April 30, 2008

Litho Guru Optimistic
About Nanoimprint
Ben Eynon, director of advanced technology development at Samsung (Seoul, South Korea) and associate director of lithography at Sematech (Austin, Texas), discussed Samsung's evaluation of nanoimprint lithography at the SEMI Strategic Business Conference (Napa Valley, Calif.). "The resolution is there for sure, it's a matter of the defects and throughput," he said.
Read more >>		 MORE NEWS...

Real Men/Women Do Have Fabs

SAFC Expands Specialty Chemical Business

National Semi Cuts 130 Jobs, Expects $10M Charge

FormFactor Has Q1 Revenues of $65.7M, Down 36% YoY

Nanowires Grown by Catalyst-Free Method

Nanoimprint Lithography Passes Tests at NIST

SEZ Reports Small Operating Loss for Fiscal 2007

MORE >>

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May 20: Can Copper Deposition Break the 32 nm Barrier?
It is uncertain how extendible copper deposition processes will be at the 32 nm node and beyond. In this webcast, a panel of industry experts will discuss possible options and solutions for metallization schemes. Panelists include: Eric Eisenbraun of the University at Albany-SUNY and Zsolt Tökei of IMEC.
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Views on News: TSMC and the Reverse Temperature Effect
SI News Editor David Lammers blogs about TSMC's 40 nm process and the "reverse temperature effect," which hits performance as the low-power (40LP) transistors shrink. TSMC's answer: A 40LPG process that adds three mask layers to boost performance for 3G cell phone and video game chipsets.

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