D2I Project Reduces Mask Inspection Time
Kenji Tsuda, Asia Contributing Editor — Semiconductor International, 4/21/2008

Japan's mask inspection research project, Mask D2I (design, drawing and inspection), has developed a method to reduce mask inspection times by as much as 40% by discriminating between defects on critical and non-critical patterns. It has also achieved two major improvements: shortening the review of repetitive patterns and simplifying defect decisions based on a prioritization technique. The threshold to determine a defect or normal pattern is simplified, speeding up search time. More

FEI, Imago to Collaborate, Hint at Possible Merger
David Lammers, News Editor — Semiconductor International, 4/15/2008

FEI Co. and Imago Scientific Instruments Inc. announced a collaboration for the distribution and marketing of Imago's atom probe microscopes, a relationship that allows for FEI to establish an equity position in Imago and the option to purchase it in the future. According to industry observers, much of FEI's recent growth has been in medical research and scientific and university labs, with the company diversifying into biotech and medical research. This is viewed as a good move because of the semiconductor industry's current precarious environment. More

KLA-Tencor Moves Forward With ICOS Acquisition
Ann Steffora Mutschler, Senior Editor — Electronic News, 4/8/2008

In the next step in its friendly takeover of Leuven, Belgium-based ICOS Vision Systems Corp NV, KLA-Tencor announced that it has launched its tender offer to purchase all outstanding shares, warrants and options of ICOS. ICOS' board of directors has already issued a memorandum recommending that the company's security holders accept KLA-Tencor's takeover bid. Belgian regulators have approved the prospectus relating to the tender offer and ICOS board memorandum. More

Intel Considering Closing Philippines Test, Assembly Plant
Ann Steffora Mutschler, Senior Editor — Electronic News, 4/7/2008

After 34 years in the Philippines, chip giant Intel is considering closing down its test and assembly plant there this year. Local employees were notified during a meeting that the company was exploring multiple options for the manufacturing plant, with one of these being to close the facility. If it is closed, it is unclear if there would be an impact on the recently launched Intel-STMicroelectronics flash joint venture Numonyx, which has some of its 7000 employees located in the Philippines. More

Novellus Orders CyberOptics Semiconductor Metrology Tools
Business Wire, 4/17/2008

CyberOptics Semiconductor announced that Novellus has placed multiple orders for its WaferSense Automatic Gapping System for use with the Novellus Vector Express and Vector Extreme PECVD systems. More

An Estimate of Metrologists
Alexander E. Braun, Senior Editor — Semiconductor International, 4/10/2008

There is still time to participate as a presenter in the 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics conference. The event, which is held every two years, will take place at the College of Nanoscale Science & Engineering, University at Albany, New York, from May 11 to 14, 2009. Leaders in the field will present results of research in the areas of metrology and characterization, particularly as these pertain to nanoelectronics. December 17 is the deadline for submitting an abstract for a contributed poster paper. Blog

Reference Metrology=Red Bricks?
Alexander E. Braun, Senior Editor — Semiconductor International, 4/1/2008

Reference metrology has been identified as a major challenge facing the measurement capability analysis area. The problem's source is the industry's rapid progress and unique metrology requirements, which develop so fast that relevant standards are often unavailable. Consequently, there often is no traceable linkage between the realization of the SI (Systeme International d'Unites, or International System of Units) unit of length — the meter — and measurements in the fab line. More

Metrology: Where is the Added Value?
Alexander E. Braun, Senior Editor — Semiconductor International, 3/27/2008

Traditionally, metrology has not been viewed as being much of a value-added proposition; its tools and platforms are expensive and often difficult to operate. This is no longer the case, thanks to a groundbreaking study, "The Economic Impact of Measurement in the Semiconductor Industry," by the National Institute of Standards and Technology (NIST). The study provides, for the first time ever, comprehensive estimates of the measurement infrastructure's value to the industry's high-tech supply chain. Results indicate that while the industry does invest considerable amounts in metrology, the benefits are substantial. Blog

Aerial Imaging Simplifies Mask Inspection
Alexander E. Braun, Senior Editor — Semiconductor International, 4/15/2008

Mask complexity has complicated inspection. Low k₁ lithography, for example, requires aggressive OPCs and phase-shift masks, combined with extreme off-axis illumination. Applied Materials has unveiled the Aera2 Mask Inspection system, which delivers what the company describes as the fastest, most powerful inspection and qualification solution for advanced masks. It uses aerial imaging technology and should meet inspection requirements for defect detection of immersion and double patterning masks for 45 nm and beyond, addressing all mask shop inspection applications at double the throughput. The tool is the first inspection system that immediately shows how a mask pattern will appear on the wafer. Blog

3-D AFM

Test Measurement Unit

The ITC59200 is a test measurement unit designed to determine safe operating area (SOA). Die attach testing is performed to detect voids under the die and other types of device construction flaws that could affect the lifetime and SOA of the device.
Integrated Technology Corp., Tempe, Ariz.
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Inspection Module

April 28-30, 2008: Strategic Business Conference (SBC)

April 29-30, 2008: MASH

May 5-7, 2008: Advanced Semiconductor Manufacturing Conference