• Sematech Seeks EUV Mask Tool Funding

  David Lammers, News Editor, June 30, 2009
  Few commercial suppliers are stepping up to develop the EUV mask inspection tools that will be needed for 22 nm EUV patterning, said Bryan Rice, director of lithography at Sematech. The consortium is organizing a meeting at SEMICON West of government, consortia and private industry leaders to develop financial support for the EUV mask infrastructure.  More

• Advanced Imaging Solutions for Shrinking the k1 Gap

  SEMI, San Jose, June 25, 2009
  There's still room for improvement in optical lithography. At SEMICON West, Stephen Renwick of Nikon Precision Inc. will share his perspective on how much more the industry can get out of 193 nm optical litho, and — perhaps more important — what it will take to get there.  More

• SEMICON West Session Focuses on 22 nm Lithography

  SEMI, San Jose, June 25, 2009
  Moderated by Semiconductor International Executive Editor Aaron Hand, the "Lithography Challenges and Solutions" session at the Device Scaling TechXPOT at SEMICON West (located in North Hall at Moscone Center) will feature technologists from across the semiconductor supply chain.  More

• Printable Electronics Hits Display Needs

  Michael P.C. Watts, Impattern Solutions, Austin, Texas, June 24, 2009
  Printable electronics could reduce the cost of making flexible displays of the kind used in the Kindle and other E-books. At the recent SID 2009 conference, researchers discussed the marriage of printable electronics and low-power displays used in emerging portable devices, which must be light, flexible, low-power, and readable in ambient light.  More

• Applied, DNS Reshuffle Stakes in Sokudo

  David Lammers, News Editor, June 23, 2009
  Applied Materials and Dainippon Screen said they are adjusting ownership in the Sokudo track joint venture established in 2006. Applied will reduce its share of the JV to 19%, making Sokudo a subsidiary of DNS. Sokudo had losses of ~$122M in the fiscal year ending March 31, 2009.  More

• EUV Reduced to an Engineering Problem

  Laura Peters, Editor-in-Chief, June 9, 2009
  EUV seems to be finally at the stage of "just an engineering problem," though a sufficiently powerful and reliable source has yet to be worked out. ASML's Martin van den Brink said his company plans to introduce a production EUV tool, capable of delivering 60 wph throughput, next year.  More

• Rave Lands Rhazer at Chartered's Fab 7

  Staff, June 9, 2009
  Rave LLC said its Rhazer haze removal technology has been evaluated by Chartered Semiconductor. The Singapore-based foundry has purchased the Rhazer tool to mitigate photomask haze at its 300 mm fab in Singapore.  More

• Nikon to Reduce Lithography Workforce by 1000

  Staff, May 27, 2009
  Facing “further severe business conditions,” Nikon Corp. said it will reorganize its lithography operations, cutting 800 production workers in Japan and 200 marketing and support staff worldwide. By October, Nikon plans to combine four production subsidiaries into two, focused on IC and display equipment.  More

Next ›

• Resource Center
• Browse Categories
• Browse Companies

Featured Company

• WL Gore & Associates

  

  The company began in 1958, when Bill and Vieve Gore set out to explore opportunities for fluorocarbon polymers, especially polytetrafluoroethylene (PTFE). Within the first twelve years, Gore had wire and cables on the moon and operations... more

---

Most Recent Resources

• Characterization and Optimization of Single Wafer Processing...
• The Lean Supply Chain Report - Lean Concepts Transcend Manufacturing...
• Cable Particulation Study for Clean Room Environments
• Innovative Scratch-Resistant Solutions for DRIE Processes