Alexander E. Braun
Alexander E. Braun, Senior Editor, joined SI 10 years ago with more than 20 years of experience covering the electronics industry. He has worked in various PR and marcom positions, as well as Editor-in-Chief of Microwave System News, and on the senior staff of Defense Electronics magazine, the Microwave Journal and the Journal of Electronic Defense. Alex is based in San Jose, Calif. User Stats
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The Measure of All ThingsRecent PostsA Modest ProposalMay 13, 2008 | Link This | Email this | Comments (4) For decades now, there has been a desperate wringing of hands and loud, roaring noises of sadness and despair over the fact that we are losing our technical infrastructure because companies are migrating to other countries, attracted by more genial business climates, mostly due to those nations’ lower labor costs and their governments’ economic breaks, offered to almost any company willing to move its means of production there. There have been very strong complaints on our side, but very little has been done. Yes, Congress shows deep co...Read More Industries: Business/Market, Inspection, Measurement & Test, New Products, Photovoltaics, Related Industries Recent PostsRevisiting a Conference and Some Ongoing ProblemsMay 9, 2008 | Link This | Email this | Comments (0) Industries: Fab Facilities, Inspection, Measurement & Test, Lithography, New Products, Related Industries, Wafer Processing, Yield Management Recent PostsIP Theft: Innovation at RiskApril 23, 2008 | Link This | Email this | Comments (4) Industries: Business/Market, Fab Facilities, Inspection, Measurement & Test, Lithography, Materials, Nanotechnology, Photovoltaics, Related Industries, Wafer Processing Recent PostsAerial Imaging Simplifies Mask InspectionApril 15, 2008 | Link This | Email this | Comments (0) Mask inspection certainly has not been made any easier by the continuing complexity being designed into masks to enable them to print the desired features on the wafer. Low k1 lithography, for example, requires aggressive OPCs, phase-shift masks, combined with extreme off-axis illumination. These and other factors have combined to create major inspection hurdles. Each generation of photomasks incorporates increasingly sophisticated resolution enhancement techniques that reduce the correlation between the pattern on the mask and that on the printed wafer. This can present a problem for traditional inspection systems because they can only produce an image of the mask itself, and it has been a while since there was a connec...Read More Industries: Inspection, Measurement & Test, Lithography, New Products, Yield Management Recent PostsAn Estimate of MetrologistsApril 10, 2008 | Link This | Email this | Comments (1) Author James Lipton spent the better part of two decades researching and accumulating “nouns of multitude,” which are used to describe the gathering of commonplace or exotic creatures, such as a litter of puppies, a pride of lions, or a knot of toads. His book, ...Read More Industries: Inspection, Measurement & Test, Lithography, Materials, MEMS, Nanotechnology
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