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The Donut Mystery
April 9, 2008

John Halladay, a clean process manager at Spansion’s Fab 25, brought a good mystery to Sematech’s Surface Preparation and Cleaning Conference here last week.

 

While yield losses often are at the edge of the wafer, Spansion had a donut-shaped area at the center of the wafer populated with bad die. At first, engineers thought the culprit was the trench plasma-etch process. 

 

The Spansion team brought in detectives from SEZ America (Phoenix) and QCept Technologies (Atlanta). Their slide deck includes some intriguing visuals.

 

Halladay said the Spansion-SEZ-QCept team used the ChemitriQ system from QCept to create about three million images. The ChemitriQ system performs a non-optical wafer-level scan that relies on the electronic work function of the materials under scan. As part of the surface charge study, the team studied the deionized water (DIW) and realized that frictional charge was building up between the water and the surface of the wafer. The spin speed was high enough that “the electrons had no place to go,” Halladay said, creating arcs on the wafer that created what looked  like bullet holes.

 

The team then had to figure out a solution to the frictional charging caused by the spin speed of the water at the surface of the wafer. Halladay said carbon dioxide (CO2) was added to reduce the resistivity of the dionized water, which “eliminated the arcing completely.”

 

While QCept was established several years ago based on technology developed at the Georgia Institute of Technology and has installed inspection systems in the field, the Sematech SPCC conference resembled a coming-out party for QCept, which played a role in three papers at the meeting in Austin
 

The two other presentations QCept had a hand in came from a CEA-Leti – Qcept inspection effort, and a Semitool (Kalispell, Mont.) project to develop a post via wet etch cleaning process.

 

The Semitool-Qcept presentation included more pictures of wafers with the bad die collected – you guessed it – at the center of the wafer. The problem was outgassing from the vias, creating the kind of non-visual defects (NVDs) which the ChemitriQ system is adept at finding. These NVDs are caused by trace metallics, organics/ inorganic residues, and the kind of surface charging which the Spansion-SEZ team dealt with.

 

Engineers teaming together to solve a problem are what make manufacturing an exciting field. The doctors on the TV drama “House” or the forensic scientists on “CSI” don’t have anything on people like John Halladay.

 

 

 


Posted by David Lammers on April 9, 2008 | Comments (4)


Industries: Clean Processing
April 9, 2008
In response to: The Donut Mystery
guest commented:

nice find... friction-induced charging should be pretty prevalent, I would now expect.




April 11, 2008
In response to: The Donut Mystery
Jim Clemens commented:

HI Dave, Remember me. You and I knew each other when I ran the ATT/NEC Joint VLSI Research Program. You were also the one that said that my acceptence remarks for the 1999 JJ Ebers Award were sappy! "Gee, thanks for everything Mom." I just wanted to point out that I am very happy now in pursuing many others fields of science and technology. But I wanted to point out to you that the addition of CO2 to wafer cleaning water is a very old technique. Wafer sparking was routinely observed in the fablines of Western Electric (1980's) and was traced to yield issues. Rinsing water has to be conductive. CO2 was the obvious answer to form a dilute conducting solution of carbonic acid. It's realy interesting that problems are "rediscovered" every twenty years and then solved again. I am suprised that you forgot this industry standard practice. Jim Clemens, President Athena Consulting




April 30, 2008
In response to: The Donut Mystery
Azmat commented:

Indeed Jim (Clemens) in just about all disciplines this is observed - the old timers move on, the institutional history is 'lost' and some smart person rediscovers the problem, organizations spend lots of resources re-solving, and life goes on.




July 17, 2008
In response to: The Donut Mystery
Utpal Chakrabarti commented:

i have used CO2 snow cleaning in manufacture of optoelectronic devices. In addition use of dissolved CO2 in water became the standard practice in GaAs wafer cleaning to reduce particle adhesion on the surface of Semi-insulating substrates





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