Dutch Inventor Develops Time-Optimal Setpoint Generator

ALEXANDRIA, Va., March 26 -- Joris Jan Van Der Sande of Eindhoven, Netherlands, has developed a time-optimal setpoint generator.

According to the U.S. Patent & Trademark Office: "The present invention discloses a lithographic apparatus, a device manufacturing method, and a robotics system capable of specifying a trajectory to be followed by a substrate relative to a radiation beam comprising a position and/or an orientation as a function of time. The specified trajectory is characterized as a mathematical smooth function up to at least the third order which connects a first state and a second state, wherein both the first state and the second state comprise boundary values for at least the position and/or the orientation and for first and second derivatives of the position and/or orientation."

The inventor was issued U.S. Patent No. 7,341,822 on March 11.

The patent has been assigned to ASML Netherlands BV, Veldhoven, Netherlands.

The original application was filed on Jan. 28, 2004, and is available at: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=7,341,822.PN.&OS=PN/7,341,822&RS=PN/7,341,822.

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