SEMATECH to Hold Workshops on Developments in EUV Source Technology and Forward Thinking Solutions for Optical Lithography; Technical Workshops Held in Conjunction with Highly Anticipated Litho Forum

SEMATECH, a pioneering research consortium of leading semiconductor manufacturers, will hold two workshops to guide critical thinking on extending the semiconductor lithography roadmap. The one-day technical workshops, "EUV Source Workshop" and "Approaching the Optical Limit: Workshop on Lithography at 22nm and 16nm," will be held in conjunction with the SEMATECH Litho Forum, May 12 - 15, 2008.

The EUV Source Workshop will facilitate a discussion among suppliers, academia/researchers, and other experts to assess the current status and development plans that enable EUV pre-production and manufacturing tools. Speakers from major EUV source suppliers will update recent progress being made in source performance and roadmaps to achieve reliable, high power sources for the next generation of EUV exposure tools.

The workshop will feature a summary of a recent SEMATECH survey by a wide cross-section of the EUV community which ranks the critical issues facing EUV sources. The goal of the workshop is for attendees to have a clear and timely understanding of the status and plans for EUV source development today.

The EUV Source Workshop will take place on Monday, May 12, 2008, 9:00 a.m. to 3:00 p.m., prior to the Litho Forum, at The Sagamore Resort, Bolton Landing, NY.

The SEMATECH Workshop on Optical Lithography at 22nm and 16nm will focus on technical approaches and key challenges to the extension of immersion lithography to the 22nm half-pitch and beyond.

A cross-section of experts from lithography and related fields will cover a variety of visionary concepts, stimulating speculative discussions and debate on the technical merit of the proposed approaches and challenges on extensions to optical lithography. The goal of the workshop is to identify if there is a viable and timely path for extending optical lithography beyond currently envisioned solutions.

Approaching the Optical Limit: Workshop on Lithography at 22nm and 16nm will take place on Thursday, May 15, 2008, 8:00 a.m. to 5:00 p.m., immediately following the Litho Forum, at The Sagamore Resort, Bolton Landing, NY.

For more information or to register for these SEMATECH-sponsored workshops visit the company's website athttp://www.sematech.org/meetings/announcements/8352/.

About SEMATECH

For 20 years, SEMATECH® (www.sematech.org), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.