Mapper to Ship E-Beam Lithography System to TSMC
Staff -- Semiconductor International, 10/13/2008 9:48:00 AM
Mapper Lithography (Delft, Netherlands) said it will ship its first 300 mm multiple-electron-beam (e-beam) maskless lithography platform to Taiwan Semiconductor Manufacturing Co. Ltd. (TSMC, Hsinchu, Taiwan) for 22 nm process development and device prototyping.
“Mapper’s technology holds great promise for cost-effective manufacturing at 22 nm and beyond,” said Jack Sun, vice president of R&D at TSMC. “We are therefore going to test Mapper’s solution to see whether it will live up to its promise. Using this first tool, we will be able to explore its viability for manufacturing. Mapper’s solution is a serious candidate to become the future lithography standard.”
Mapper’s eventual full-production system will use up to 13,000 parallel e-beams to directly write circuit patterns, the company said.
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| Christopher Hegarty, CEO, Mapper |
