Conductor Etch Series
Staff -- Semiconductor International, 8/1/2008
The 2300 Versys Kiyo3x conductor etch series delivers CD uniformity of 1 nm, 3? across a wafer. This third-generation line includes improvements in wafer temperature control that enable radial tuning for edge control and profile shaping. It has pre-coat and post-etch chamber clean techniques, and a multi-film etch capability in a single chamber. Lam Research Corp., Fremont, Calif., www.lamresearch.com
