Mask Qualification System
Staff -- Semiconductor International, 10/15/2006
AIMS 45-193i is a mask qualification tool that emulates the imaging of photomasks for 193 nm immersion scanners down to the 45 nm node. It enables the review of photomasks under real stepper imaging conditions, allowing the tool to analyze mask performance and qualify defects as “printing” or “non-printing” defects. The system includes a vector effect emulation capability to allow users to study rigorous polarization effects as they appear in reticles and the scanner technology itself. It has a NA of 1.4. Carl Zeiss SMT, Jena, Germany, www.smt.zeiss.com
