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Fab Automation Gets Boost From Interface A

Aaron Hand, Managing Editor -- Semiconductor International, 6/15/2006

Sidebars:
Fab Automation Executive Viewpoints

Last year at SEMICON West, the Esplanade Hall at Moscone Center was the Emerging Technology hall, but also included manufacturing and design automation. This year, it will be called the Manufacturing Productivity and Effectiveness hall. "The big areas it covers are e-manufacturing, electronic design automation, and other productivity improvements," said John Ellis, senior director of technology and standards at SEMI. "E-manufacturing includes things like automatic process control, automatic equipment control, e-diagnostics, and the suite of standards that includes Interface A. That allows connectivity much better than our old SECS/GEM standard."

Along with the technical advances of the semiconductor manufacturing processes themselves, factory productivity and efficient manufacturing control are key to a fab's success. In fact, that success increasingly relies on the collection and analysis of growing amounts of detailed process, measurement and operational data from the equipment to improve yield, efficiency, productivity and more. As processes become more complex, it becomes more important to use the data to reduce process variation, minimize the impact of excursions, and improve overall equipment effectiveness.

The SEMI-created Interface A has generated quite a buzz lately in fab automation. It is a relatively new suite of equipment data acquisition (EDA) standards that take advantage of open standards, such as XML web services, to provide fabs with more complete and useful data for key process, metrology, operational and other applications.

Although Interface A offers improved data ports over SECS/GEM, it does not replace the SECS/GEM or 300 mm standards, which pertain to equipment control and configuration. It is also distinct from Interface B, which facilitates data sharing between applications, and Interface C, which provides remote access to equipment data.1 Industry adoption of Interface A has been gaining momentum, but more needs to be done to fully implement the standard across the industry.

Last year at an e-manufacturing workshop sponsored by the International Sematech Manufacturing Initiative (ISMI), IBM's Perry Hartswick noted his company's continued yield learning requirements, including increased data availability and accessibility, consistent data integrity, increased data granularity, and consistent timeliness of data. With preparation for the standard underway, he expected Interface A to enable a shorter time to integrate a tool into the factory, done through the use of equipment self-description. Process control function continues to increase, he noted, but more and finer grained process data was required, and time stamping and ordering of events and data needed to be improved (not only for Interface A).


Reference
  1. B. Rubow, "The Standard Pieces of SEMI's Interface A ," Semiconductor International , July 2005.
 

Fab Automation Executive Viewpoints

Steve Schwartz, CEO, Asyst Technologies Inc.

We see three trends emerging that have significant implications for chipmakers and the equipment industry. The first is 45 nm, which we believe will drive the need for advanced process control capabilities that are only achievable through real-time access to equipment data as envisioned in the Interface A standard. As a result, at SEMICON West 2006, we expect chipmakers to begin to explore the Interface A tool connectivity capabilities of factory software systems and tools.

The second trend is in fab automation, where we see process complexity and productivity needs driving dramatic changes in material handling requirements. Process complexity is driving up the number of process steps and thus the number of FOUP and wafer moves required to fabricate advanced devices. At the same time, customers want to limit the floor space allocated to stockers and sorters and contain cycle times. The industry is beginning to reach the theoretical limits of what can be accomplished through simply increasing the speed of current material handling systems. To meet future requirements, the industry will soon need to embrace innovative new technologies and approaches for material stocking, material transport, and tool loading. We believe that customers will have the opportunity to see some of these new technologies at SEMICON West this year.

The final trend relates to tool automation, specifically atmospheric wafer handling through the equipment front-end module (EFEM). An increasing number of equipment suppliers are beginning to recognize the EFEM as a value-added aspect of their tools, because the EFEM offers an opportunity to improve total tool performance, reliability and cost of ownership. Some of this relates to the ability of the EFEM to efficiently integrate with the tool. But as fabs are becoming increasingly automated, EFEMs also need to be capable of integrating seamlessly into the fab automation environment. At the show, we expect to see an increasing number of equipment suppliers and chipmakers exploring options to optimize and exploit the performance capabilities of new EFEM designs.

Bill Ramus, Senior Vice President, Commercial Management, ILS Technology

As device manufacturers look to extend the life of CMOS technology to its logical limits (and introduce new paradigms such as nanotechnology), the need to work in secure, real-time, collaborative environments becomes increasingly paramount. Specifically, we're beginning to see early adoption of tools that enable secure, remote collaborations in which selected intellectual property can be shared with partners from any point around the world, with the assurance that proprietary information will remain so. The trend is taking hold because new developments, leveraging the learning from e-manufacturing applications designed to improve equipment productivity using remote access technology, are allowing productive collaboration while preserving all parties' trade secrets — that is, technologies now exist to allow companies to dynamically control the sharing of information at various points throughout the collaborative process.

In the past, for example, before design for manufacturing (DFM) trends reshaped operations, manufacturing processes occurred in a sequential fashion — for example, a design house would hand off a chip design to the mask shop, the mask shop would deliver the mask set to the fab, and the fab would run the process. When problems erupted, they were dumped back on the design house, fixed, and the process would begin again. With real-time, secure collaborations, however, all parties can access IP that has been approved as being allowed to be shared simultaneously, allowing for quicker resolution of process problems and, ultimately, improvements in the time it takes to get a device into volume, high-yield production.

With the advent of this new capability, we expect to see more companies begin to solidify new policies around remote collaborations, be it in the context of technology development, DFM or management of one's supply chain. After all, while enabling online collaboration is key, each party in the process must be able to fence off portions of its IP in a dynamic fashion with flexibility to set business policy rules in regards to who can see what, when and where, depending on conditions in the environment, inside the fab or inside a manufacturing relationship.

Bob Reback, President & CEO, Cimetrex Inc.

Overall equipment efficiency (OEE) using SEMI's new e-manufacturing standards known as Interface A will be a hot topic this year. IC makers are investing in various equipment engineering systems (EES) for better control of the more complex fabrication processes necessary to support ever-shrinking geometries. Equipment suppliers are required to support the traditional SECS/GEM port for "command and control," while the new Interface A port will be used for "on-demand quality data."

A lot has happened in the last 12 months. As fab production engineers learn about the flexibility, quality and capabilities of Interface A, it appears there will soon be a time when they don't know how they ever survived without it. There are still challenges to overcome as IC makers prepare for fabwide EES implementations using the new standards.

Find more information on fab automation.

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