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Handbook of Semiconductor Manufacturing Technology

-- Semiconductor International, 10/1/2000

Yoshio Nishi and Robert Doering, Editors
Marcel Dekker Inc., $195
www.dekker.com

This massive, one-volume, 1157-page reference work is the result of cooperation between Yoshio Nishi and Robert Doering. Nishi is senior vice president of Texas Instruments (Dallas), an IEEE fellow and recipient of the IEEE's 1995 Jack A. Morton award; Doering is a senior fellow at TI, and author of more than 120 articles and conference papers. They have gathered the work of 85 contributors into 37 chapters, successfully sandwiching between the Handbook's covers the entire field of semiconductor manufacturing. The reader will find reference material ranging from basic subjects such as an "Introduction to Semiconductor Equipment" to more esoteric ones such as "Dopant Diffusion," "Silicidation," "Alternate Interlevel Dielectrics," "Photoresist Materials and Processing" and others.

A very useful part of the book is its overview sections, which serve as practical introductions to groups of closely related chapters. There are overviews of semiconductor devices, interconnect and process control. Each chapter offers extensive references as well as bibliographies, which can be used easily as a guide to other, more specialized works.

The book's coverage is not limited to processing. There are seminal chapters on "Environment, Safety and Health," "Factory Modeling" and "Economics of Semiconductor Manufacturing." At the back, appendices cover "Physical Constants," "Units Conversion," "Standards Commonly Used in Semiconductor Manufacturing" and a practical list of acronyms. Each chapter is well researched and written, with abundant tables, graphs and illustrations that clarify and amplify the text.

Besides being one of the most complete one-volume works of its kind, one aspect that makes the Handbook unique and interesting is that Nishi and Doering gave the contributors ample autonomy to address the various subjects. So each chapter presents what is often a personal view on a particular topic, ranging from explanatory background and history to intriguing considerations of possible futures. Since many chapters are written by more than one person, the perspective on the subjects is gratifyingly wide.

Some readers might be disappointed that this book addresses only silicon-based manufacturing; but many of its subjects are partially applicable to other device substrates, and the references and bibliographies adequately point the road to subjects beyond the book's scope. Both novice and mature engineers should find the Handbook of Semiconductor Manufacturing Technology a good read and a valuable library addition. •

— Alexander E. Braun
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