Company News
Staff -- Semiconductor International, 11/1/2004
Sigma-C GmbH (Munich, Germany), which develops applied-simulation software for chipmakers and maskmakers, announced the appointment of Peter G. Feist as general manager and COO. He has more than 20 years of executive management and senior strategic marketing experience with semiconductor companies in Silicon Valley and Europe. He was most recently president and CEO of PACT XPP Technologies AG (Munich).
Micron Technology Inc. (Boise, Idaho) and ASML MaskTools (Santa Clara, Calif.) announced a comprehensive multi-year business agreement to enhance the capability of lithography tools. The agreement focuses on low-k1 imaging solutions at 90 nm and below. The agreement relates to creating and improving practical applications for resolution enhancement techniques.
- Just a few months after IMEC (Leuven, Belgium) launched its 193 nm immersion lithography program, more than 30 prominent IC manufacturers, tool suppliers, resist and BARC suppliers, mask shops and software suppliers are now members of the IMEC Industrial Affiliation Program (IIAP). In separate news, IMEC and KLA-Tencor (San Jose) have entered a joint-development project to accelerate the adoption of optical CD metrology for sub-65 nm lithography process control.
Nikon (Tokyo), ASML (Veldhoven, Netherlands) and Carl Zeiss SMT (Oberkochen, Germany) have agreed to a comprehensive settlement of legal proceedings and cross-license of patents related to lithography equipment. The terms of the agreement include payments to Nikon by ASML of $87M, and by Zeiss of $58M. The three companies expect to execute definitive settlement and cross-license agreements and dismiss all legal proceedings between the parties this month.
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