Webcast: Progress Report on Low-k Dielectrics
-- Semiconductor International, 6/1/2003
Tuesday, June 24, 2003
12:00 noon - 1:00 p.m. CDT
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Senior editor Laura Peters will lead a panel of experts from the IC manufacturing community in a discussion of the pros and cons of using low-k dielectrics in production manufacturing, including business implications and financial considerations. They will also address the challenges associated with advanced low-k dielectrics.
Whether you have already settled on your low-k solution (k<3.0) or you need to review latest findings in low-k dielectrics, you won't want to miss this webcast. REGISTER TODAY.
Moderator
Laura Peters
Senior Editor, Semiconductor International
More on Low-k Dielectrics
The Look of Low-k for 90 nm and SoC
Peter Singer, Editor-in-Chief -- Semiconductor International, 3/1/2003
Symposium Investigates Reliability Near the Red Brick Wall
Laura Peters -- Semiconductor International, 3/1/2003
Low-k Dielectrics Pose New Reliability Concerns
Laura Peters -- Semiconductor International, 2/1/2003
Resist Technology Concentrates on 248 nm
Alexander E. Braun, Senior Editor -- Semiconductor International, 2/1/2003
Low-k Drives New Stripping Solutions
Laura Peters, Senior Editor -- Semiconductor International, 10/1/2002
Intel Unveils 90 nm Process
Peter Singer, Editor-in-Chief -- Semiconductor International, 9/1/2002
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