Handbook of Silicon Semiconductor Metrology
Alexander E. Braun -- Semiconductor International, 2/1/2003
Alain C. Diebold, Editor, Mercel Dekker Inc.,
$195
www.dekker.com
The Handbook of Silicon Semiconductor
Metrology , edited by Alain C. Diebold, is a cornerstone reference source for anyone involved in semiconductor metrology or processing, whether in R&D or manufacturing. The book has a split personality, acting both as a textbook and reference work. Its coverage is uniquely ample and thorough. Topics include transistor fabrication metrology, defect detection and characterization, cleanroom-based measurement technology, and model-based measurements.
The handbook also addresses critical dimension, overlay, acoustic film thickness, dopant dose, junction depth and electrical measurements. Important areas such as optical measurements and in-line calibration methods are adequately surveyed, as is metrology for lithography, transistor, capacitor and on-chip interconnect process technologies.
With some 500 drawings, photographs and SEMs, as well as almost 1300 references, the handbook details sensor-based process control, electrical test-based statistical metrology, and data management. It offers definitions of in situ, in-line, off-line and integrated metrology, emphasizing the evaluation of measurement capability, precision and accuracy. It clearly explains the relationship between process flow and metrology, assesses defect review tools, and considers the improvement of physical measurement methods to meet exacting requirements. It also analyzes the increasingly complex and costly information systems that store and extract information from data. A distinctive feature of this work is that the experts who authored the various chapters explain, whenever possible, the underlying science of measurement as well as its application to current materials and processes.
