Company News
Staff -- Semiconductor International, 7/1/2002
- Corning Tropel Corp. (Fairport, N.Y.) has manufactured a lithographic objective lens with an NA of 0.85, able to resolve features smaller than 70 nm. The lens was designed and built for Exitech Ltd.'s (Oxford, UK) MS-157 microstepper, which is being used by Selete (Totsuka, Japan) to image features as small as 50 nm.
- Intelligent Micro Patterning LLC (IMP, St. Petersburg, Fla.) has announced that Silicon Sense Inc. (Nashua, N.H.) is now responsible for all of its North American sales activities. Primary responsibility will be for IMP's SF-100 maskless exposure system.
- DuPont Photomasks Inc. (DPI, Round Rock, Texas) has signed an agreement with Cypress Semiconductor Corp. (San Jose) to jointly develop advanced photomask technologies. A separate multi-year agreement calls for DPI to provide a significant majority of Cypress'photomasks for production.
- Hinds Instruments (Hillsboro, Ore.) presented 157 nm birefringence maps of CaF2 samples at International SEMATECH's (ISMT, Austin, Texas) latest 157 nm Technical Data Review in Dallas. This was the first multi-dimensional characterization of CaF2's birefringence resulting from collaboration between Hinds and ISMT.
- New Vision Systems (NVS, Cambridge, Mass.) said that Integrated Device Technology (IDT, Santa Clara, Calif.) has selected NVS' ARGUS APC software to control its lithography process. Deployment is underway at IDT's facility in Hillsboro, Ore.
- Mentor Graphics Corp. (Wilsonville, Ore.) has reached agreement with IMEC (Leuven, Belgium) to cooperate on the development of subwavelength photolithography. IMEC will use Mentor's Calibre RET software to advance high-NA 193 and 157 nm lithography processes.
