Company News
Staff -- Semiconductor International, 1/1/2002
ASML (Veldhoven, Netherlands) announced that its 193 nm lithography systems will be offered on a single platform—the 300 mm TWINSCAN AT:1100. The company has discontinued the development and shipment of its Micrascan V systems, acquired through ASML's recent merger with SVG Lithography. ASML will extend TWINSCAN competencies to its facility in Wilton, Conn., also acquired through the merger. In other news, ASML has created an Asian training center in Kawasaki, Japan. It will provide courses in advanced lithography, wafer track and thermal processing technology, with a particular focus on 300 mm equipment.
Micronic Laser Systems AB (Täby, Sweden) has received an order from a leading Japanese photomask manufacturer for a single-beam pattern generator for TFT and color filter applications.
Numerical Technologies Inc. (San Jose) is licensing its Virtual Stepper System to Leica Microsystems, which will offer the software as an option with its LWM250 UV and DUV reticle measurement and review tools.
DuPont Photomasks Inc. (DPI, Round Rock, Texas) has announced the appointment of John Suzuki as president of DuPont Photomasks Japan K.K. He has almost 40 years of experience in Japan's semiconductor equipment industry, most recently with Etec Systems Japan Ltd. DPI also announced that Kenneth A. Rygler, executive vice president of worldwide marketing and strategic planning, has resigned from the company. Rygler, who founded DPI 15 years ago, will serve as a consultant to the company. Thomas J. Blake, currently director of investor relations and corporate communications, has been named vice president of marketing.
Numerical Technologies Inc. (San Jose) has appointed Fabio Angelillis as senior vice president of engineering. He will drive the company's engineering and R&D activities to support industry adoption of subwavelength technology solutions. Angelillis has experience managing large engineering teams in the development of market-leading software products.
Extraction Systems Inc. (Franklin, Mass.) has added Robert Akins, chairman and CEO of Cymer Inc. (San Diego), to its board of directors. With his knowledge of the semiconductor industry and DUV lithography in particular, Akins will help guide Extraction in addressing lithography requirements. The company also appointed James Hudzik as sales manager of mask products.
Micronic Laser Systems AB (Täby, Sweden) has appointed Masashi Tsutsui as president of Micronic Japan K.K. Tsutsui will lead overall operations at the Japanese subsidiary. He previously spent almost 20 years at Marubeni Corp., most recently as assistant general manager of the nuclear power department.
