Agreement to Develop Mask Solutions

-- Semiconductor International, 5/1/1999

An agreement to work together in providing advanced photomask solutions for subwavelength lithography processes critical to advanced IC manufacturing has been announced by Numerical Technologies (NumeriTech) and Photronics. The joint effort will focus on optimal integration of the IC design and reticle manufacturing processes. NumeriTech will provide the software that addresses the technical challenges of incorporating the phase shifting and OPC enhancements required on subwavelength ICs, and Photronics will manufacture them on the reticles. Anticipated are shorter cycle times, increased wafer yields, reduced subwavelength reticle costs and enhanced device performance.

The agreement between the two companies forms a critical link between subwavelength design and photomask manufacturing for both phase shifting and OPC technologies. Together, these technologies enhance the performance of wafer lithography systems and enable semiconductor device features to be printed at subwavelength dimensions.

'We are seeing increased customer demand for optically enhanced photomasks using automated design tools,' stated Steve Carlson, vice president of technology at Photronics. Developing a strong user interface between IC designers and solution providers will likely accelerate the adoption of enhanced masks in broad-based semiconductor fabrication.