ASML to Participate in EUV-LLC Program
-- Semiconductor International, 8/1/1999
ASM Lithography (ASML, Veldhoven, Netherlands) has signed a contract to participate in the semiconductor industry's Extreme Ultraviolet Limited Liability Company (EUV-LLC) program. The EUV-LLC is a consortium to develop EUV wafer-fabrication technology. Members include Intel, Motorola and Advanced Micro Devices (AMD), and the U.S. Department of Energy's Lawrence Livermore, Sandia and Berkeley national laboratories.ASML also is researching SCALPEL in a separate cooperative effort with Applied Materials and Lucent Technologies, and is working in the European program IPL with Infineon, IMS, LEICA and others on the development of ion-beam lithography.
The agreement between ASML and EUV-LLC also will facilitate cooperative research and communication in EUV technologies among the EUV-LLC, the U.S. Virtual National Laboratory and the European Union's EUCLIDES program, according to ASML officials. EUCLIDES is led by ASML, and includes optics and fine mechanics manufacturer Carl Zeiss and synchrotron source supplier Oxford Instruments.
