EUV Lithography Gains Momentum

-- Semiconductor International, 8/1/1999

The drive toward multiple generations of extreme ultraviolet (EUV) lithography systems gained further momentum following completion of a critical milestone and design review stipulated by Silicon Valley Group's (San Jose, Calif.) partnership with the EUV Limited Liability Company (EUV LLC).

The EUV LLC is a consortium comprised of Intel, Motorola and AMD. Silicon Valley Group (SVG), the Virtual National Laboratory (VNL) and others are among the contributors to the partnership. By successfully passing this milestone review, SVG is on track to present in September detailed technical and business plans for a first-generation EUV lithography system, considered a viable choice for lithographic tools for 70 nm and below.

SVG's first-generation EUV tools are expected to be available in 2003, with volume production for circuit features at 70 nm and below projected for 2005.

The Virtual National Laboratory includes Lawrence Berkeley National Laboratory (LBNL), Lawrence Livermore National Laboratory (LLNL) and Sandia National Laboratories (SNL), all of which work under the auspices of the U.S. Department of Energy (DOE).