ASML Looks at 157 nm by 2003

-- Semiconductor International, 8/1/1999

ASM Lithography (ASML, Veldhoven, Netherlands) has begun what it describes as 'an active 157 nm technology development program to extend imaging capabilities beyond 193 nm technology.' The program's goal is to deliver production lithography systems by 2003. It is expected to facilitate research activities for 157 nm optics among ASML's strategic technology partners, which include Carl Zeiss, optic materials supplier Schott, and laser suppliers Cymer and Lambda Physik.

Initial design studies by ASML and Zeiss indicate it is technically feasible to build a very high NA lens that will enable a 157 nm system to achieve greater resolution and process latitude than is possible with 193 nm technology. Beyond the exposure system, however, other technical and business hurdles remain in pioneering a complete 157 nm lithography solution. For example, photoresist and process developments would have to be completed within a timeframe that is much more accelerated than the industry has ever before attempted. ASML is investigating, together with the microelectronics research organization IMEC, the feasibility of starting a 157 nm process development program, to help a fast ramp-up of this technology.

ASML expects to complete design concept studies for a 157 nm lithography system by the middle of next year, and begin preparing the infrastructure for system development and prototyping, with the goal of shipping the first 157 nm production systems to IC development groups by 2003.